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On the occasion of the 100th birthday of the Chinese Communist Party, a former researcher from the school of integrated circuits of Beihang University wrote "100 years, China core" on a nano-magnetic film five atomic layers thick.
As is known to all, below the meter is the decimeter, below the decimeter is the inside, below the centimeter is the millimeter, mM behind there (silk meters) , Kum meters, microns, Nano (NM) and so on, so nano-sized magnetic film, we have their own mind.
According to the knowledge of the Tongmao Linear Motor Group, during the production of magnetic chips, the wafers need to be "laid flat" to prevent the wafers from being coated on the nanometer magnetic film. The difficulty factor of this process is very high, which is equivalent to the fact that the Haidian District ground in Beijing is evenly covered with five layers of millet grains and must be very flat. To this end, the scientific research team of Beihang College of integrated circuits has overcome all difficulties and developed a wafer-level magneto-optic Kerr Tester. The researchers of the School of integrated circuits of Beihang University of Aeronautics and Astronautics have made use of this tester to measure the flatness of the nanometer magnetic film. By writing on the thin film with a tiny magnetic needle, if the color contrast of the characters is the same and the handwriting is clear, then the thin film has good uniformity. When it comes to chip manufacturing, whether it is wafer testing equipment or wafer packaging equipment, are closely related to linear motor, linear motor with high-speed, high-precision, high-stability and so on, has been vigorously introduced into the chip production as a driving device for related instruments.
Tongmao linear motor is developed and produced by Tongmao Electronic Co. , Ltd. in Kunshan. It adopts European and American Technical Standards and processing technology, with high performance, high quality and so on.
The article was originally written by www.tmmotion.com in Kunshan, China. Please quote the source.